Synthesis and characterization of Nanoscale-SiO2
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Graphical Abstract
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Abstract
Nanoscale silica were prepared by the Sol-Gel method with CH3CH2OH and Si(OC2H5)4.Under different heat-treatment temperatures, the phase and microstructure of the nanoscale silica were studied with FT-IR,XRD and TEM.It is resulted that sol-concentration and its pH value are the important factor which determine the gelation time.Nanoscale-SiO2 the average diameter is about 20nm and which have acceptable thermal stability were obtained with 600℃ sintering.
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